Thin film growth & modelling 3
09 June 2026
Conferences
GROM
•
GROM 3
•
15:50
>
16:50
•
Thin film growth & modelling 3
•
Auditorium
GROM
15:50
•
GROM3-O1-105
•
Reactive sputtering of niobium disulfide thin films from niobium target using H2S as a reactive gas
>
T.
Tomas
Nyberg (Uppsala)
16:10
•
GROM3-O2-193
•
Optimization of scandium oxide thin film deposition by magnetron sputtering
>
N.
Nawel
Merghem (Nancy)
16:30
•
GROM3-O3-085
•
MAX based Ti-A-C (A = Si, Ge) thin films by High Power Impulse Magnetron Sputtering
>
P.
Philipp
Dörflinger (Vienna)
|